Abstract :
Asimple,inexpensive,pulsed laser deposition(PLD)technique used to deposite nickel oxide NiO thin films on glass substrate. Structural, optical and electricalparameters were studied. Moreover, the surface morphology of the deposited samples was also examined. The optical absorbance spectra for the studied samples showed the maximum value around 280 nm.On the other hand, thickness interferometry measurement of the tested samples was around 400 nm. The optical energy gap and refractive index of the NiO thin film was determined. Electrical measurement showed that the film was P-type